High Purity Ultra Fine Polishing Oxide Cerium Powder 99.999%
제품 상세정보
| 애플리케이션: | 광학 유리, 결정질 재료 | 용법: | 도자기, 유리, 형광체 |
|---|---|---|---|
| 키워드: | 파우더를 닦는 세륨 옥사이드 | 분자량: | 392.24g/mol |
| 밀도: | 4.5-7.0 g/cm³(특정 산화물에 따라 다름) | UV 절연도: | UVB>90% UVA>60% |
| 응용: | 촉매, 자석, 형광체, 세라믹 | 카스: | 13709-42-7 |
| 견본: | 사용 가능 | 청정: | 99.9% 이상 |
| 포장: | 50 킬로그램 /는 드럼을 칩니다 | 공식: | Y2O3 |
| 물의 용해도: | 물에 불용성, 적당히 | 색상: | 흰색에서 황백색까지 |
| 화학식: | 이트륨 | ||
| 강조하다 |
high purity cerium powder,Ultra Fine cerium powder,Fine cerium oxide for glass polishing |
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제품 설명
Ultra-Clean 5N Cerium Oxide for Precision Optical & Semiconductor Polishing
Overview:
Lichen High Purity Ultra-Fine Cerium Oxide Polishing Powder (99.999%) is a premium-grade 5N cerium oxide (CeO₂) engineered for the most demanding precision polishing and surface finishing applications. With ultra-low impurity levels and narrow, ultra-fine particle size distribution, this product delivers exceptional surface smoothness, minimal defect generation, and highly repeatable polishing performance.
It is specifically designed for advanced optics, semiconductor substrates, photonics, and high-value glass components where even trace contamination or surface damage is unacceptable.
Key Features & Advantages
Ultra-High Purity (5N, 99.999%)
Extremely low metallic and ionic impurities reduce contamination risk in sensitive processes.
Ultra-Fine Particle Size Distribution
Enables controlled, gentle material removal with superior surface smoothness.
Low Defect Generation
Minimizes micro-scratches, haze, pits, and subsurface damage.
Excellent Batch Consistency
Ensures stable polishing performance in high-precision manufacturing.
High Chemical–Mechanical Polishing Efficiency
Optimized cerium chemistry enhances polishing selectivity and efficiency on glass and oxide surfaces.
Typical Applications
Precision Optical Polishing
Lenses, prisms, windows, and laser optics.
Semiconductor & Glass Wafer Finishing
Polishing of glass wafers, oxide layers, and specialty substrates.
Photonics & Display Glass
High-clarity surfaces for photonic components and advanced display panels.
Pre-Coating Surface Preparation
Ultra-clean surfaces prior to AR and optical thin-film coatings.
제품 하이라이트
Ultra-Clean 5N Cerium Oxide for Precision Optical & Semiconductor Polishing Overview: Lichen High Purity Ultra-Fine Cerium Oxide Polishing Powder (99.999%) is a premium-grade 5N cerium oxide (CeO₂) engineered for the most demanding precision polishing and surface finishing applications. With ultra...
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