"rare earth metal"
先進的なスプレーコーティングのための機能的ナノセリウム酸化添加物
Nano Cerium Oxide for Outdoor Weather-Resistant Coatings Product Overview Nano Cerium Oxide (CeO₂) is a multifunctional inorganic nanomaterial developed for high-performance coating applications. Owing to its unique nano structure, oxygen vacancy characteristics, and excellent chemical stability, it ...
高表面積 自動車用触媒コンバーター製造用セリウム酸化物
High Surface Area Cerium Oxide For Automotive Catalytic Converter Production Description Cerium Oxide (CeO₂) is an essential functional material used in the manufacturing of automotive catalytic converters and advanced emission control systems. Acting as an oxygen storage and redox catalyst ...
耐候性外壁塗装用ナノセリウム酸化物
Nano Cerium Oxide for Outdoor Weather-Resistant Coatings Product Overview Nano Cerium Oxide is an advanced functional rare earth material designed to enhance the long-term performance of outdoor coating systems. Its outstanding UV absorption capability, oxygen storage capacity, and chemical ...
レーザー光学部品用高純度酸化セリウム研磨粉
High Purity Cerium Oxide Polishing Powder for Laser Optical Components Product Overview High Purity Cerium Oxide Polishing Powder is engineered for ultra-precision polishing of laser optical components requiring exceptional surface quality, low subsurface damage, and excellent dimensional accuracy. ...
ウェハー＆先端基板用半導体グレード酸化セリウム研磨粉
Semiconductor Grade Cerium Oxide Polishing Powder for Wafer & Advanced Substrates Product Overview Semiconductor Grade Cerium Oxide Polishing Powder is formulated for defect-sensitive polishing applications in semiconductor and advanced electronic substrate manufacturing. The controlled purity and ...
無水性ディスプロシウム粉末 ネオジミウム塩化物 原材料
Anhydrous Neodymium Chloride Molecular Formula: NdCl₃Appearance: Anhydrous neodymium chloride is a pink powdery crystal. Application: Used for producing metallic neodymium, as a raw material in the field of pharmaceutical catalysis or single crystal growth. Item Specification Testing Standard Grade ...
CMPセリウムオキシド 半導体ガラスウエファーのための磨き粉
Cerium Oxide Polishing Powder for Semiconductor Wafers Description Lichen Cerium Oxide Polishing Powder for Semiconductor Wafers is a high-purity, precision-engineered abrasive designed for wafer surface finishing and planarization processes. With tightly controlled particle size distribution and ...
CMP セリウム ポリッシュ 粉 玻璃 ポリッシュ ためのセリウム オキシード シリコン ウェーファー
Polishing Powder for Silicon Wafer CMP Description Achieve the extreme planarity required for semiconductor nodes with our Advanced Cerium Oxide (CeO₂) Polishing Powders. Specifically engineered for Chemical Mechanical Planarization (CMP), our powders are designed for the high-volume manufacturing ...
ODM セリウムオキシドベースの磨き粉末と化合物 磨き塗りスラム
Polishing Slurry for Ultra-Fine Electronics Surfaces Overview: Our Polishing Slurry for Ultra-Fine Electronics Surfaces is meticulously engineered to deliver precise, high-quality finishes for the most delicate electronics applications. With advanced cerium oxide-based technology, this slurry is ...
半導体ガラスのための精細平面化セリウム酸化物スラム
Slurry For Fine Planarization Of Semiconductor Glass Description Lichen Cerium-Based Polishing Slurry for Fine Planarization of Semiconductor Glass is a high-purity, ready-to-use slurry engineered for advanced glass planarization processes in semiconductor manufacturing. Formulated with precisely ...
半導体ウエファー磨き用のカスタマイズされたセリウム磨き粉末ペスト
Polishing Powder For Ultra-Fine Wafer Polishing Description Lichen Cerium-Based Polishing Slurry for Fine Planarization of Semiconductor Glass is a high-purity, ready-to-use slurry engineered for advanced glass planarization processes in semiconductor manufacturing. Formulated with precisely ...
プラナライゼーション セリウムオキシド スラージー 半導体ガラス用 磨きパスタ
Cerium Oxide Slurry For Semiconductor Glass Substrates Description Lichen Cerium Oxide Slurry for Semiconductor Glass Substrates is a high-purity, water-based polishing slurry formulated specifically for semiconductor glass applications. This slurry provides excellent material removal rates, ...
