Качество CMP Cerium Oxide Rare Earth Polishing Slurry Powder For Silicon Wafer Custom Фабрика
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Качество CMP Cerium Oxide Rare Earth Polishing Slurry Powder For Silicon Wafer Custom Фабрика
Качество CMP Cerium Oxide Rare Earth Polishing Slurry Powder For Silicon Wafer Custom Фабрика
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CMP Cerium Oxide Rare Earth Polishing Slurry Powder For Silicon Wafer Custom

Наименование марки: LICHEN
Номер модели: LCR0130
Место происхождения: Китай
Сертификация: ISO9001
Минимальное количество заказа: 20 кг
Цена: NEGOCIABLE
Способность к поставкам: 250 тонн/месяц

Детали продукта


Размер частиц: 3,0±0,2 мкм № КАС.: 1306-38-3
CeO2: 99% Ставка приостановки: Высокий
Диапазон Ph: 7-10 Формулировка: Индивидуальные
Выделить

Custom Rare Earth Polishing Slurry

,

Silicon Wafer Rare Earth Polishing Slurry

,

Silicon Wafer cerium polishing powder

Характер продукции

Cerium Oxide CMP Polishing Slurry for Silicon Wafer

Description

Achieve atomic-level planarity and superior device yields with our Series Cerium Oxide (CeO₂) CMP Slurries. Specifically engineered for the most demanding Chemical Mechanical Planarization (CMP) processes in semiconductor fabrication. 

In 2026, as wafer geometries become increasingly complex, our ceria-based formulations provide the high selectivity and ultra-low defectivity. 

 

Performance Excellence 

High Selectivity & Removal Rates: Engineered for precise performance, our slurries offer tunable selectivity ratios while maintaining high material removal rates (MRR).

Nano-Defect Control: Utilizing monodisperse, sub-100nm particle technology, we virtually eliminate micro-scratches and surface pits, significantly increasing wafer-sort yields.

Advanced Suspension Stability: Our formulations feature proprietary stabilizers that prevent particle agglomeration and, ensuring consistent performance from the first wafer to the last in high-volume production.

High Purity (>99%): Refined to meet high standards, preventing trace-metal and ionic contamination.

 

Tech Data

Molecular Formula CAS No. CeO₂ %  D50 (μm) Appearance Application
CeO2 1306-38-3 99% 3.0±0.2 White Slurry Silicon Wafer

 

Q&A

1. What is rare earth polishing powder?

Rare earth polishing powder is a high-purity compound used for polishing optical components, semiconductor wafers, and delicate surfaces like glass and lenses. It delivers a smooth, high-clarity finish without damaging the material.

2. How do I choose the right rare earth polishing powder for my application?

To select the ideal polishing powder, consider factors like the material you’re polishing, the required finish, and specifications like particle size and purity. Our sales team is available to help you choose the perfect product for your needs.

3. How should I store  rare earth polishing powder?

Store in a cool, dry place, away from moisture and direct sunlight. Keep the powder in airtight containers to prevent contamination and maintain its effectiveness. With proper storage, it typically lasts 1-2 years.

4. Do you provide customized rare earth formulations?

Yes, we offer custom rare earth polishing powders and slurries, tailored to meet your specific needs, including adjustments to particle size, chemical composition, or slurry consistency.

5. Can I get a sample before making a bulk order?

Absolutely! We provide samples for evaluation. Contact our team to request a sample, and we’ll arrange the shipment.

6. How can I place an order? What is the typical delivery time?

To place an order, simply contact our sales team, who will guide you through the process and provide a quote. Delivery times vary based on order size, location, and stock availability, and we’ll give you an estimated schedule once the order is confirmed.

Основные характеристики продукта

Cerium Oxide CMP Polishing Slurry for Silicon Wafer Description Achieve atomic-level planarity and superior device yields with our Series Cerium Oxide (CeO₂) CMP Slurries. Specifically engineered for the most demanding Chemical Mechanical Planarization (CMP) processes in semiconductor fabrication. ...

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