High Performance Ceria Slurry for Sapphire Wafer and Crystal Polishing
Product Details
| Abrasive Material: | High Purity Cerium Oxide | Particle Size (D50): | 0.3 – 1.0 μm |
|---|---|---|---|
| Solid Content: | 10 – 30 Wt% | PH: | 6.5 – 9.0 |
| Appearance: | White Slurry | Surface Finish: | Ultra Precision |
| Highlight |
Ceria slurry for sapphire wafer polishing,Rare earth polishing slurry for crystals,High performance ceria slurry with warranty |
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Product Description
High Performance Ceria Slurry for Sapphire Wafer and Crystal Polishing
Product Overview
Professional ceria slurry optimized for sapphire polishing applications in semiconductor and optical industries. Achieves high surface smoothness, stable polishing efficiency, and low subsurface damage for sapphire wafers, LED substrates, and optical crystals.
Key Features
- Optimized for hard sapphire materials
- Excellent polishing efficiency and surface quality
- Low subsurface damage
- Stable chemical and mechanical performance
- Good dispersion and anti-settling properties
- Supports precision wafer finishing processes
Particle Size Distribution
Applications
- Sapphire wafer polishing
- LED substrate polishing
- Optical sapphire window polishing
- Semiconductor crystal finishing
- Watch glass polishing
- Hard crystal material processing
Why Choose Lichen as Your Global Supplier
- Dedicated ceria & alumina polishing manufacturer
- Stable rare earth raw material supply chain
- Customized particle engineering capability
- Consistent batch-to-batch quality control
- Technical support for polishing process optimization
Product Highlights
High Performance Ceria Slurry for Sapphire Wafer and Crystal Polishing Product Overview Professional ceria slurry optimized for sapphire polishing applications in semiconductor and optical industries. Achieves high surface smoothness, stable polishing efficiency, and low subsurface damage for ...
High Removal Rate Ceria Slurry for Optical Glass and Semiconductor Polishing
High Removal Rate Ceria Slurry for Optical Glass and Semiconductor Polishing Product Overview High removal rate ceria slurry developed for fast and efficient polishing of optical glass and semiconductor substrates. Combines excellent material removal performance with stable surface quality to improve production efficiency and reduce processing time. Key Features High polishing efficiency and throughput Fast material removal capability Excellent process stability Reduced
High Performance Ceria Slurry for Sapphire Wafer and Crystal Polishing
High Performance Ceria Slurry for Sapphire Wafer and Crystal Polishing Product Overview Professional ceria slurry optimized for sapphire polishing applications in semiconductor and optical industries. Achieves high surface smoothness, stable polishing efficiency, and low subsurface damage for sapphire wafers, LED substrates, and optical crystals. Key Features Optimized for hard sapphire materials Excellent polishing efficiency and surface quality Low subsurface damage Stable
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