Nano Ceria CMP Slurry for Optical Glass & Wafer Polishing | Cerium Oxide Polishing Slurry
Product Details
| Product Name: | Ceria CMP Slurry | Abrasive Material: | CeO₂ |
|---|---|---|---|
| Particle Size: | Customized | Purity Of CeO₂: | ≥99.9% |
| Solid Content: | Customized | PH: | Customized |
| Highlight |
Nano Ceria CMP Slurry for Optical Glass,Cerium Oxide Polishing Slurry for Wafer,Rare Earth Polishing Slurry with Warranty |
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Product Description
Nano Ceria CMP Slurry for Optical Glass & Wafer Polishing | Cerium Oxide Polishing Slurry
Product Overview
Our Nano Ceria CMP Slurry is engineered for precision polishing of optical substrates and specialty wafers requiring superior surface quality. Utilizing cerium oxide nanoparticles, the slurry combines chemical activity with mechanical polishing to achieve excellent flatness, transparency, and low surface roughness.
The formulation is optimized for stable polishing performance while minimizing defects and scratches.
Key Features
- Nano-sized cerium oxide abrasive
- Uniform particle size distribution
- Excellent scratch resistance
- High polishing precision
- Stable suspension system
- Excellent surface finish
- Low agglomeration
- Consistent polishing performance
- Custom formulation available
Particle Size Distribution
Applications
- Optical glass polishing
- Quartz wafer polishing
- Sapphire substrate polishing
- Precision ceramic polishing
- Display glass manufacturing
- Photonic component polishing
- High-precision optics
Frequently Asked Questions
Q1. What substrates can be polished?
Suitable for optical glass, sapphire, quartz, ceramics, and other precision substrates.
Q2. Does the slurry reduce scratches?
Yes. The controlled nano particle size helps reduce scratching while maintaining high polishing efficiency.
Q3. Can particle size be customized?
Yes
Q4. Do you provide technical support?
Yes. We can recommend suitable slurry formulations based on your polishing process and substrate material.
Product Highlights
Nano Ceria CMP Slurry for Optical Glass & Wafer Polishing | Cerium Oxide Polishing Slurry Product Overview Our Nano Ceria CMP Slurry is engineered for precision polishing of optical substrates and specialty wafers requiring superior surface quality. Utilizing cerium oxide nanoparticles, the slurry ...
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