Ultra-Fine Cerium Oxide Polishing Powder for Laser Crystals & Precision Optics
Product Details
| Purity: | ≥ 99.95% | D50: | 0.3 – 0.8 µm |
|---|---|---|---|
| Particle Size Distribution: | Narrow | PH (15% Suspension): | 6.5 – 8.5 |
| Appearance: | Light Yellow Powder | Surface Finish Capability: | Sub-nanometer Level |
| Highlight |
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Product Description
Ultra-Fine Cerium Oxide Polishing Powder for Laser Crystals & Precision Optics
Product Overview
Ultra-Fine Cerium Oxide Polishing Powder is developed for ultra-precision polishing processes requiring superior surface finish and minimal subsurface damage. The refined particle distribution enables smooth finishing of laser crystals and advanced optical materials used in high-performance photonics systems.
Ideal for final polishing stages demanding nanometer-level surface quality.
Key Features
- Ultra-fine particle distribution
- Exceptional surface smoothness
- Low scratch generation
- Reduced subsurface damage
- High polishing stability
- Excellent reproducibility between batches
Particle Size Distribution
Applications
- Laser crystal polishing (YAG, sapphire, fused silica)
- High-precision optical components
- Photonics and laser optics finishing
- Scientific optical instruments
- Final polishing processes
Frequently Asked Questions
Q1. What is the difference between cerium oxide polishing powder grades?
Cerium oxide polishing powders are designed for different polishing stages and materials.
Selecting the proper grade depends on substrate material, required surface roughness, and polishing process conditions.
Q2. Which materials can be polished using cerium oxide polishing powder?
Cerium oxide polishing powder is widely used in advanced manufacturing industries and is suitable for:
- Optical glass and fused silica
- Sapphire and laser crystals
- Photonics components
- Silicon wafers
- Semiconductor substrates
- Precision optical and laser elements
Its chemical-mechanical polishing mechanism enables excellent surface finishing with minimal subsurface damage.
Q3. Can cerium oxide polishing powder be customized for specific polishing processes?
Yes. Cerium oxide polishing powder can be tailored according to customer requirements, including:
- Particle size distribution
- Removal rate performance
- Surface finish targets
- Slurry preparation concentration
- Application-specific formulations
Technical support and sample evaluation are typically available to optimize polishing performance for different equipment and materials.
Product Highlights
Ultra-Fine Cerium Oxide Polishing Powder for Laser Crystals & Precision Optics Product Overview Ultra-Fine Cerium Oxide Polishing Powder is developed for ultra-precision polishing processes requiring superior surface finish and minimal subsurface damage. The refined particle distribution enables ...
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