Quality Ultra-Low Defect Cerium Oxide CMP Slurry For Semiconductor Silicon Wafer Manufacturing factory
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Quality Ultra-Low Defect Cerium Oxide CMP Slurry For Semiconductor Silicon Wafer Manufacturing factory
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Ultra-Low Defect Cerium Oxide CMP Slurry For Semiconductor Silicon Wafer Manufacturing

Brand Name: LICHEN
Model Number: LC
Place of Origin: CHINA
Certification: ISO
Minimum Order Quantity: 20KGS
Price: Contact us
Supply Ability: 3000MT/YEAR

Product Details


Purity: ≥ 99.95% Solid Content: 5-30 Wt%
Particle Size (D50): 30-120 Nm PH Range: Adjustable
Removal Rate Uniformity: Excellent Shelf Life: 6–12 Months
Highlight

Ultra-low defect cerium oxide CMP slurry

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Cerium oxide slurry for semiconductor wafers

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Rare earth polishing slurry for silicon

Product Description


Ultra-Low Defect Cerium Oxide CMP Slurry For Semiconductor Silicon Wafer Manufacturing

Product Overview

Our ultra-low defect cerium oxide CMP slurry is designed to meet the stringent requirements of next-generation semiconductor fabrication. The slurry delivers precise chemical-mechanical interaction between abrasive particles and silicon surfaces, enabling atomic-scale planarization required for advanced nodes and high-performance devices.

Engineered for compatibility with leading CMP platforms, the slurry supports stable processing across extended polishing cycles while maintaining consistent removal rates and excellent wafer yield performance.

Key Technical Advantages

  • Atomic-level surface finishing capability
  • Excellent defect control for advanced nodes
  • High process stability
  • Reduced scratch and haze formation
  • Optimized chemical reactivity
  • Semiconductor-grade purity control
  • Reliable large-scale manufacturing performance


Particle Size Distribution

Ultra-Low Defect Cerium Oxide CMP Slurry For Semiconductor Silicon Wafer Manufacturing 0

Applications

  • Advanced node semiconductor fabrication
  • STI and ILD planarization support
  • Silicon substrate finishing
  • CMP process development
  • Foundry and IDM manufacturing lines

Product Highlights

Ultra-Low Defect Cerium Oxide CMP Slurry For Semiconductor Silicon Wafer Manufacturing Product Overview Our ultra-low defect cerium oxide CMP slurry is designed to meet the stringent requirements of next-generation semiconductor fabrication. The slurry delivers precise chemical-mechanical interactio...

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