4N High Purity Cerium Oxide Powder for Semiconductor CMP
Product Details
| Chemical Formula: | CeO₂ | CeO₂ Purity: | 4N |
|---|---|---|---|
| Particle Size: | 0.1–0.3 μm | Appearance: | Light Yellow |
| Dispersion: | Customizable According To Application | Packaging: | CUSTOMISE |
| Highlight |
4N high purity cerium oxide powder,cerium oxide for semiconductor CMP,rare earth oxide cerium powder |
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Product Description
4N High Purity Cerium Oxide Powder for Semiconductor CMP
Product Overview
Semiconductor CMP grade cerium oxide (ceria) powder is ultra high purity rare earth oxide designed for chemical mechanical planarization in semiconductor manufacturing. Strict control over coarse particles and metal impurities ensures high removal selectivity on silicon dioxide layers while minimizing scratches, surface defects and contamination on wafer substrates for advanced semiconductor industrial applications.
Key Features
- Ultra-low heavy metal impurity and coarse particle content
- High SiO₂ removal selectivity versus silicon nitride film
- Uniform particle morphology with low agglomeration rate
- Low surface defect rate for wafer planarization process
- Rigorous batch consistency for semiconductor mass production
Particle Size Distribution
Applications
- Semiconductor wafer CMP, shallow trench isolation (STI) oxide planarization
- Fused silica and quartz substrate ultra-precision polishing
- Display glass substrate fine polishing
- Advanced semiconductor packaging material surface planarization
Frequently Asked Questions
Q: Can this CMP cerium oxide powder be used for STI polishing process?
A: Yes, this grade is widely used for shallow trench isolation oxide polishing in semiconductor industry.
Q: What documents can you supply for semiconductor grade cerium oxide?
A: COA, MSDS and elemental impurity analysis reports are available upon request.
Q: Do you supply CMP slurry or only raw cerium oxide powder?
A: We provide raw ceria powder. Custom CMP slurry formulation technical support can be offered.
Product Highlights
4N High Purity Cerium Oxide Powder for Semiconductor CMP Product Overview Semiconductor CMP grade cerium oxide (ceria) powder is ultra high purity rare earth oxide designed for chemical mechanical planarization in semiconductor manufacturing. Strict control over coarse particles and metal impurities ...
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