کیفیت High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment کارخانه
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کیفیت High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment کارخانه
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High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment

نام تجاری: LICHEN
شماره مدل: LC
مکان مبداء: چین
گواهینامه: ISO
حداقل مقدار سفارش: 20 کیلو گرم
قیمت: Contact Sales Team for Quotation
توانایی عرضه: 3000 تن در سال

جزئیات محصول


فرمول شیمیایی: y₂o₃ خلوص: 99.99٪
مورفولوژی: کروی / آگلومره نقطه ذوب: 2430 درجه سانتی گراد
اندازه ذرات: قابل تنظیم کنترل ناخالصی: درجه نیمه هادی
برجسته کردن

high-purity yttrium oxide semiconductor coating,yttrium oxide thermal spray coating,rare earth oxide plasma spray coating

,

yttrium oxide thermal spray coating

,

rare earth oxide plasma spray coating

توضیحات محصول


High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment

Description

High-purity yttrium oxide powder designed for plasma spray coating of semiconductor equipment. Excellent plasma corrosion resistance, low particle contamination, and extended chamber lifetime.

Product Features

Superior Plasma Corrosion Resistance

Yttrium oxide demonstrates outstanding resistance to fluorine and chlorine plasma environments commonly used in semiconductor etching and deposition processes.

Low Particle Contamination

Dense Y₂O₃ coatings significantly reduce particle shedding, helping maintain ultra-clean semiconductor production conditions and improving wafer yield.

Extended Equipment Lifetime

Protects chamber components from chemical erosion and plasma damage, lowering maintenance frequency and operational downtime.

Excellent Thermal Stability

High melting point and chemical inertness allow stable performance under extreme temperatures and high-energy plasma exposure.

Typical Applications

Semiconductor Process Equipment Protection

  • Plasma Etching Chambers
  • CVD / PECVD Systems
  • ALD Deposition Equipment
  • Plasma Cleaning Systems

Key Components

  • Electrostatic Chuck (ESC) coating
  • Focus Rings
  • Shower Heads
  • Chamber Liners
  • Edge Rings & Shields
  • Wafer Handling Components

 

Particle Size Distribution


High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment 0

Quality & Manufacturing

Produced under strict semiconductor material quality control:

  • High-purity rare earth refining process
  • Controlled particle morphology engineering
  • Advanced granulation technology
  • Multi-stage impurity monitoring

Competitive Advantages

  • Semiconductor-grade purity control
  • Stable global export supply
  • Custom spray coating optimization
  • Technical support for coating processes
  • Reliable batch-to-batch consistency

نکات برجسته محصول

High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment Description High-purity yttrium oxide powder designed for plasma spray coating of semiconductor equipment. Excellent plasma corrosion resistance, low particle contamination, and extended chamber ...

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