High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment
Szczegóły produktu
| Wzór chemiczny: | Y₂O₃ | Czystość: | 99,99% |
|---|---|---|---|
| Morfologia: | Kulisty/aglomerowany | Temperatura topnienia: | 2430°C |
| Rozmiar cząstek: | Możliwość dostosowania | Kontrola zanieczyszczeń: | Stopień półprzewodnika |
| Podkreślić |
high-purity yttrium oxide semiconductor coating,yttrium oxide thermal spray coating,rare earth oxide plasma spray coating |
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Opis produktu
High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment
Description
High-purity yttrium oxide powder designed for plasma spray coating of semiconductor equipment. Excellent plasma corrosion resistance, low particle contamination, and extended chamber lifetime.
Product Features
Superior Plasma Corrosion Resistance
Yttrium oxide demonstrates outstanding resistance to fluorine and chlorine plasma environments commonly used in semiconductor etching and deposition processes.
Low Particle Contamination
Dense Y₂O₃ coatings significantly reduce particle shedding, helping maintain ultra-clean semiconductor production conditions and improving wafer yield.
Extended Equipment Lifetime
Protects chamber components from chemical erosion and plasma damage, lowering maintenance frequency and operational downtime.
Excellent Thermal Stability
High melting point and chemical inertness allow stable performance under extreme temperatures and high-energy plasma exposure.
Typical Applications
Semiconductor Process Equipment Protection
- Plasma Etching Chambers
- CVD / PECVD Systems
- ALD Deposition Equipment
- Plasma Cleaning Systems
Key Components
- Electrostatic Chuck (ESC) coating
- Focus Rings
- Shower Heads
- Chamber Liners
- Edge Rings & Shields
- Wafer Handling Components
Particle Size Distribution
Quality & Manufacturing
Produced under strict semiconductor material quality control:
- High-purity rare earth refining process
- Controlled particle morphology engineering
- Advanced granulation technology
- Multi-stage impurity monitoring
Competitive Advantages
- Semiconductor-grade purity control
- Stable global export supply
- Custom spray coating optimization
- Technical support for coating processes
- Reliable batch-to-batch consistency
Najważniejsze cechy produktu
High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment Description High-purity yttrium oxide powder designed for plasma spray coating of semiconductor equipment. Excellent plasma corrosion resistance, low particle contamination, and extended chamber ...
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