Ποιότητα High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment Εργοστάσιο
<
Ποιότητα High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment Εργοστάσιο
>

High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment

Ονομασία μάρκας: LICHEN
Αριθμός μοντέλου: LC
Τόπος προέλευσης: Κίνα
Πιστοποίηση: ISO
Ελάχιστη ποσότητα παραγγελίας: 20 κιλά
Τιμή: Contact Sales Team for Quotation
Ικανότητα εφοδιασμού: 3000MT/year

Λεπτομέρειες προιόντος


Χημικός τύπος: Y₂o₃ Καθαρότητα: 99,99%
Μορφολογία: Σφαιρικό / Συσσωματωμένο Σημείο Τήξης: 2430°C
Μέγεθος Σωματιδίων: Προσαρμόσιμο Έλεγχος ακαθαρσιών: Βαθμός ημιαγωγών
Επισημαίνω

high-purity yttrium oxide semiconductor coating

,

yttrium oxide thermal spray coating

,

rare earth oxide plasma spray coating

Περιγραφή προϊόντων


High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment

Description

High-purity yttrium oxide powder designed for plasma spray coating of semiconductor equipment. Excellent plasma corrosion resistance, low particle contamination, and extended chamber lifetime.

Product Features

Superior Plasma Corrosion Resistance

Yttrium oxide demonstrates outstanding resistance to fluorine and chlorine plasma environments commonly used in semiconductor etching and deposition processes.

Low Particle Contamination

Dense Y₂O₃ coatings significantly reduce particle shedding, helping maintain ultra-clean semiconductor production conditions and improving wafer yield.

Extended Equipment Lifetime

Protects chamber components from chemical erosion and plasma damage, lowering maintenance frequency and operational downtime.

Excellent Thermal Stability

High melting point and chemical inertness allow stable performance under extreme temperatures and high-energy plasma exposure.

Typical Applications

Semiconductor Process Equipment Protection

  • Plasma Etching Chambers
  • CVD / PECVD Systems
  • ALD Deposition Equipment
  • Plasma Cleaning Systems

Key Components

  • Electrostatic Chuck (ESC) coating
  • Focus Rings
  • Shower Heads
  • Chamber Liners
  • Edge Rings & Shields
  • Wafer Handling Components

 

Particle Size Distribution


High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment 0

Quality & Manufacturing

Produced under strict semiconductor material quality control:

  • High-purity rare earth refining process
  • Controlled particle morphology engineering
  • Advanced granulation technology
  • Multi-stage impurity monitoring

Competitive Advantages

  • Semiconductor-grade purity control
  • Stable global export supply
  • Custom spray coating optimization
  • Technical support for coating processes
  • Reliable batch-to-batch consistency

Σημαντικά σημεία του προϊόντος

High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment Description High-purity yttrium oxide powder designed for plasma spray coating of semiconductor equipment. Excellent plasma corrosion resistance, low particle contamination, and extended chamber ...

Συγγενικά προϊόντα
Ποιότητα Competitive price for Industrial Grade Rare Earth Compound Cerium Oxide Ceo2 Glass Polishing Powder Εργοστάσιο

Competitive price for Industrial Grade Rare Earth Compound Cerium Oxide Ceo2 Glass Polishing Powder

FACTORY PRICE INDUSTRIAL GRADE CERIUM OXIDE POWDER CAS NO 1306-38-3 CEO2 HIGH PURITY 99.99% GLASS POLISHING POWDER Cerium Oxide Molecular Formula: CeO₂ Appearance: Light yellow powder Uses: Used as polishing material or as a catalyst. Item Specifications Test Basis Item CeO 2 -3N5C CeO 2 -4NC CeO 2 ...

Ποιότητα Industrial Grade Rare Earth Compound Cerium Oxide Ceo2 Glass Polishing Powder Εργοστάσιο

Industrial Grade Rare Earth Compound Cerium Oxide Ceo2 Glass Polishing Powder

FACTORY PRICE INDUSTRIAL GRADE CERIUM OXIDE POWDER CAS NO 1306-38-3 CEO2 HIGH PURITY 99.99% GLASS POLISHING POWDER Cerium Oxide Molecular Formula: CeO₂ Appearance: Light yellow powder Uses: Used as polishing material or as a catalyst. Item Specifications Test Basis Item CeO 2 -3N5C CeO 2 -4NC CeO 2 ...

Ποιότητα High Quality Industrial Grade Rare Earth Compound Cerium Oxide Ceo2 Glass Polishing Powder Εργοστάσιο

High Quality Industrial Grade Rare Earth Compound Cerium Oxide Ceo2 Glass Polishing Powder

FACTORY PRICE INDUSTRIAL GRADE CERIUM OXIDE POWDER CAS NO 1306-38-3 CEO2 HIGH PURITY 99.99% GLASS POLISHING POWDER Cerium Oxide Molecular Formula: CeO₂ Appearance: Light yellow powder Uses: Used as polishing material or as a catalyst. Item Specifications Test Basis Item CeO 2 -3N5C CeO 2 -4NC CeO 2 ...

Ποιότητα Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection Εργοστάσιο

Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection

Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection Descripti on Yttrium Oxide (Y₂O₃) Spray Coating Powder is a high-performance ceramic material developed for protective coatings in advanced semiconductor fabrication equipment. Designed for plasma spray and thermal spray ...

Ζητήστε ένα απόσπασμα

Παρακαλούμε χρησιμοποιήστε την ηλεκτρονική φόρμα επικοινωνίας παρακάτω αν έχετε οποιεσδήποτε ερωτήσεις, η ομάδα μας θα επικοινωνήσει μαζί σας το συντομότερο δυνατό.

Μπορείτε να ανεβάσετε μέχρι 5 αρχεία και κάθε αρχείο μεγέθους 10M μέγιστο.