Kwaliteit Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection Fabriek
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Kwaliteit Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection Fabriek
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Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection

Merknaam: LICHEN
Modelnummer: LC
Plaats van herkomst: China
Certificering: ISO
Minimale bestelhoeveelheid: 20KG
Prijs: Contact Sales Team for Quotation
Toeleveringsvermogen: 3000MT/year

Productdetails


Materiaal: Yttriumoxide (Y2O3) Zuiverheid: 99,9%
Deeltjesvorm: Bolvormig/geagglomereerd Chemische stabiliteit: Uitstekend
Verontreinigingsniveau: ultra-low deeltjesgrootte bereik: 10–65 μm
Markeren

Yttria thermal spray powder

,

Y₂O₃ plasma etching protection

,

Rare earth oxide thermal coating

Productomschrijving


Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection

Description

Yttrium Oxide (Y₂O₃) Spray Coating Powder is a high-performance ceramic material developed for protective coatings in advanced semiconductor fabrication equipment. Designed for plasma spray and thermal spray technologies, the material forms a dense yttria ceramic layer that protects equipment components operating under aggressive plasma processing environments.

In semiconductor manufacturing processes such as plasma etching, deposition, and cleaning, chamber components are continuously exposed to fluorine-based reactive gases and energetic ions. Y₂O₃ coatings provide superior chemical stability and plasma erosion resistance, effectively reducing contamination sources and ensuring stable process performance.

The material is engineered with controlled particle morphology and optimized size distribution to achieve high coating adhesion strength, uniform microstructure, and excellent coating durability.

Product Features

Outstanding Plasma Durability

Yttria coatings exhibit excellent resistance against fluorocarbon plasma corrosion, making them ideal for next-generation semiconductor nodes.

Reduced Particle Generation

The dense ceramic coating structure minimizes micro-flaking and particle shedding inside processing chambers.

Improved Process Stability

Stable surface chemistry helps maintain repeatable semiconductor process conditions and enhances manufacturing yield.

High Deposition Efficiency

Optimized powder morphology ensures excellent flowability and coating uniformity during plasma spraying.

Long Service Lifetime

Significantly extends maintenance intervals compared with conventional ceramic coatings.

Typical Applications

Semiconductor Equipment Protection

  • Plasma Etching Systems
  • CVD / PECVD
  • ALD Systems
  • Dry Cleaning Chambers

Coated Components

  • Electrostatic Chucks (ESC)
  • Chamber Liners
  • Gas Distribution Plates
  • Edge Rings and Shields

 

Particle Size Distribution


Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection 0

Manufacturing & Quality Control

Manufactured using advanced rare earth processing technologies:

  • High-purity yttria synthesis
  • Controlled spray-grade granulation
  • Strict impurity monitoring
  • Semiconductor material quality assurance

Producthoogtepunten

Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection Description Yttrium Oxide (Y₂O₃) Spray Coating Powder is a high-performance ceramic material developed for protective coatings in advanced semiconductor fabrication equipment. Designed for plasma spray and thermal spray ...

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Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection Descripti on Yttrium Oxide (Y₂O₃) Spray Coating Powder is a high-performance ceramic material developed for protective coatings in advanced semiconductor fabrication equipment. Designed for plasma spray and thermal spray ...

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