Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection

ブランド名: LICHEN

モデル番号: LC

原産地: 中国

認証: ISO

最小注文数量: 20KGS

価格: Contact Sales Team for Quotation

供給能力: 3000MT/year

タグ

Yttria thermal spray powder

製品詳細

材料:	イトリウム酸化物 (Y2O3)	純度:	99.9%
粒子の形状:	球状・塊状	化学的安定性:	並外れた
汚染レベル:	超低い	粒子サイズの範囲:	10～65μm
ハイライト	Yttria thermal spray powder , Y₂O₃ plasma etching protection , Rare earth oxide thermal coating

製品の説明

Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection

Description

Yttrium Oxide (Y₂O₃) Spray Coating Powder is a high-performance ceramic material developed for protective coatings in advanced semiconductor fabrication equipment. Designed for plasma spray and thermal spray technologies, the material forms a dense yttria ceramic layer that protects equipment components operating under aggressive plasma processing environments.

In semiconductor manufacturing processes such as plasma etching, deposition, and cleaning, chamber components are continuously exposed to fluorine-based reactive gases and energetic ions. Y₂O₃ coatings provide superior chemical stability and plasma erosion resistance, effectively reducing contamination sources and ensuring stable process performance.

The material is engineered with controlled particle morphology and optimized size distribution to achieve high coating adhesion strength, uniform microstructure, and excellent coating durability.

Product Features

Outstanding Plasma Durability

Yttria coatings exhibit excellent resistance against fluorocarbon plasma corrosion, making them ideal for next-generation semiconductor nodes.

Reduced Particle Generation

The dense ceramic coating structure minimizes micro-flaking and particle shedding inside processing chambers.

Improved Process Stability

Stable surface chemistry helps maintain repeatable semiconductor process conditions and enhances manufacturing yield.

High Deposition Efficiency

Optimized powder morphology ensures excellent flowability and coating uniformity during plasma spraying.

Long Service Lifetime

Significantly extends maintenance intervals compared with conventional ceramic coatings.

Typical Applications

Semiconductor Equipment Protection

Plasma Etching Systems
CVD / PECVD
ALD Systems
Dry Cleaning Chambers

Coated Components

Electrostatic Chucks (ESC)
Chamber Liners
Gas Distribution Plates
Edge Rings and Shields

Particle Size Distribution

Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection 0

Manufacturing & Quality Control

Manufactured using advanced rare earth processing technologies:

High-purity yttria synthesis
Controlled spray-grade granulation
Strict impurity monitoring
Semiconductor material quality assurance

製品ハイライト

Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection Description Yttrium Oxide (Y₂O₃) Spray Coating Powder is a high-performance ceramic material developed for protective coatings in advanced semiconductor fabrication equipment. Designed for plasma spray and thermal spray ...

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