Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection
Détails de produit
| Matériel: | Oxyde d'yttrium (Y2O3) | Pureté: | 99,9% |
|---|---|---|---|
| Forme des particules: | Sphérique / Aggloméré | Stabilité chimique: | Remarquable |
| Niveau de contamination: | très réduit | gamme de taille de particules: | 10 à 65 μm |
| Mettre en évidence |
Yttria thermal spray powder,Y₂O₃ plasma etching protection,Rare earth oxide thermal coating |
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Description de produit
Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection
Description
Yttrium Oxide (Y₂O₃) Spray Coating Powder is a high-performance ceramic material developed for protective coatings in advanced semiconductor fabrication equipment. Designed for plasma spray and thermal spray technologies, the material forms a dense yttria ceramic layer that protects equipment components operating under aggressive plasma processing environments.
In semiconductor manufacturing processes such as plasma etching, deposition, and cleaning, chamber components are continuously exposed to fluorine-based reactive gases and energetic ions. Y₂O₃ coatings provide superior chemical stability and plasma erosion resistance, effectively reducing contamination sources and ensuring stable process performance.
The material is engineered with controlled particle morphology and optimized size distribution to achieve high coating adhesion strength, uniform microstructure, and excellent coating durability.
Product Features
Outstanding Plasma Durability
Yttria coatings exhibit excellent resistance against fluorocarbon plasma corrosion, making them ideal for next-generation semiconductor nodes.
Reduced Particle Generation
The dense ceramic coating structure minimizes micro-flaking and particle shedding inside processing chambers.
Improved Process Stability
Stable surface chemistry helps maintain repeatable semiconductor process conditions and enhances manufacturing yield.
High Deposition Efficiency
Optimized powder morphology ensures excellent flowability and coating uniformity during plasma spraying.
Long Service Lifetime
Significantly extends maintenance intervals compared with conventional ceramic coatings.
Typical Applications
Semiconductor Equipment Protection
- Plasma Etching Systems
- CVD / PECVD
- ALD Systems
- Dry Cleaning Chambers
Coated Components
- Electrostatic Chucks (ESC)
- Chamber Liners
- Gas Distribution Plates
- Edge Rings and Shields
Particle Size Distribution
Manufacturing & Quality Control
Manufactured using advanced rare earth processing technologies:
- High-purity yttria synthesis
- Controlled spray-grade granulation
- Strict impurity monitoring
- Semiconductor material quality assurance
Points forts du produit
Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection Description Yttrium Oxide (Y₂O₃) Spray Coating Powder is a high-performance ceramic material developed for protective coatings in advanced semiconductor fabrication equipment. Designed for plasma spray and thermal spray ...
Competitive price for Industrial Grade Rare Earth Compound Cerium Oxide Ceo2 Glass Polishing Powder
FACTORY PRICE INDUSTRIAL GRADE CERIUM OXIDE POWDER CAS NO 1306-38-3 CEO2 HIGH PURITY 99.99% GLASS POLISHING POWDER Cerium Oxide Molecular Formula: CeO₂ Appearance: Light yellow powder Uses: Used as polishing material or as a catalyst. Item Specifications Test Basis Item CeO 2 -3N5C CeO 2 -4NC CeO 2 ...
Industrial Grade Rare Earth Compound Cerium Oxide Ceo2 Glass Polishing Powder
FACTORY PRICE INDUSTRIAL GRADE CERIUM OXIDE POWDER CAS NO 1306-38-3 CEO2 HIGH PURITY 99.99% GLASS POLISHING POWDER Cerium Oxide Molecular Formula: CeO₂ Appearance: Light yellow powder Uses: Used as polishing material or as a catalyst. Item Specifications Test Basis Item CeO 2 -3N5C CeO 2 -4NC CeO 2 ...
High Quality Industrial Grade Rare Earth Compound Cerium Oxide Ceo2 Glass Polishing Powder
FACTORY PRICE INDUSTRIAL GRADE CERIUM OXIDE POWDER CAS NO 1306-38-3 CEO2 HIGH PURITY 99.99% GLASS POLISHING POWDER Cerium Oxide Molecular Formula: CeO₂ Appearance: Light yellow powder Uses: Used as polishing material or as a catalyst. Item Specifications Test Basis Item CeO 2 -3N5C CeO 2 -4NC CeO 2 ...
Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection
Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection Descripti on Yttrium Oxide (Y₂O₃) Spray Coating Powder is a high-performance ceramic material developed for protective coatings in advanced semiconductor fabrication equipment. Designed for plasma spray and thermal spray ...
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