품질 Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection 공장
<
품질 Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection 공장
>

Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection

브랜드 이름: LICHEN
모델 번호: LC
원산지: 중국
인증: ISO
최소 주문 수량: 20KGS
가격: Contact Sales Team for Quotation
공급 능력: 3000MT/year

제품 상세정보


재료: 유트륨 산화물 (Y2O3) 청정: 99.9%
입자 모양: 구형/응집형 화학적 안정성: 뛰어난
오염 수준: 극히 낮습니다 입자 크기 범위: 10~65μm
강조하다

Yttria thermal spray powder

,

Y₂O₃ plasma etching protection

,

Rare earth oxide thermal coating

제품 설명


Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection

Description

Yttrium Oxide (Y₂O₃) Spray Coating Powder is a high-performance ceramic material developed for protective coatings in advanced semiconductor fabrication equipment. Designed for plasma spray and thermal spray technologies, the material forms a dense yttria ceramic layer that protects equipment components operating under aggressive plasma processing environments.

In semiconductor manufacturing processes such as plasma etching, deposition, and cleaning, chamber components are continuously exposed to fluorine-based reactive gases and energetic ions. Y₂O₃ coatings provide superior chemical stability and plasma erosion resistance, effectively reducing contamination sources and ensuring stable process performance.

The material is engineered with controlled particle morphology and optimized size distribution to achieve high coating adhesion strength, uniform microstructure, and excellent coating durability.

Product Features

Outstanding Plasma Durability

Yttria coatings exhibit excellent resistance against fluorocarbon plasma corrosion, making them ideal for next-generation semiconductor nodes.

Reduced Particle Generation

The dense ceramic coating structure minimizes micro-flaking and particle shedding inside processing chambers.

Improved Process Stability

Stable surface chemistry helps maintain repeatable semiconductor process conditions and enhances manufacturing yield.

High Deposition Efficiency

Optimized powder morphology ensures excellent flowability and coating uniformity during plasma spraying.

Long Service Lifetime

Significantly extends maintenance intervals compared with conventional ceramic coatings.

Typical Applications

Semiconductor Equipment Protection

  • Plasma Etching Systems
  • CVD / PECVD
  • ALD Systems
  • Dry Cleaning Chambers

Coated Components

  • Electrostatic Chucks (ESC)
  • Chamber Liners
  • Gas Distribution Plates
  • Edge Rings and Shields

 

Particle Size Distribution


Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection 0

Manufacturing & Quality Control

Manufactured using advanced rare earth processing technologies:

  • High-purity yttria synthesis
  • Controlled spray-grade granulation
  • Strict impurity monitoring
  • Semiconductor material quality assurance

제품 하이라이트

Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection Description Yttrium Oxide (Y₂O₃) Spray Coating Powder is a high-performance ceramic material developed for protective coatings in advanced semiconductor fabrication equipment. Designed for plasma spray and thermal spray ...

관련 제품
품질 Competitive price for Industrial Grade Rare Earth Compound Cerium Oxide Ceo2 Glass Polishing Powder 공장

Competitive price for Industrial Grade Rare Earth Compound Cerium Oxide Ceo2 Glass Polishing Powder

FACTORY PRICE INDUSTRIAL GRADE CERIUM OXIDE POWDER CAS NO 1306-38-3 CEO2 HIGH PURITY 99.99% GLASS POLISHING POWDER Cerium Oxide Molecular Formula: CeO₂ Appearance: Light yellow powder Uses: Used as polishing material or as a catalyst. Item Specifications Test Basis Item CeO 2 -3N5C CeO 2 -4NC CeO 2 ...

품질 Industrial Grade Rare Earth Compound Cerium Oxide Ceo2 Glass Polishing Powder 공장

Industrial Grade Rare Earth Compound Cerium Oxide Ceo2 Glass Polishing Powder

FACTORY PRICE INDUSTRIAL GRADE CERIUM OXIDE POWDER CAS NO 1306-38-3 CEO2 HIGH PURITY 99.99% GLASS POLISHING POWDER Cerium Oxide Molecular Formula: CeO₂ Appearance: Light yellow powder Uses: Used as polishing material or as a catalyst. Item Specifications Test Basis Item CeO 2 -3N5C CeO 2 -4NC CeO 2 ...

품질 High Quality Industrial Grade Rare Earth Compound Cerium Oxide Ceo2 Glass Polishing Powder 공장

High Quality Industrial Grade Rare Earth Compound Cerium Oxide Ceo2 Glass Polishing Powder

FACTORY PRICE INDUSTRIAL GRADE CERIUM OXIDE POWDER CAS NO 1306-38-3 CEO2 HIGH PURITY 99.99% GLASS POLISHING POWDER Cerium Oxide Molecular Formula: CeO₂ Appearance: Light yellow powder Uses: Used as polishing material or as a catalyst. Item Specifications Test Basis Item CeO 2 -3N5C CeO 2 -4NC CeO 2 ...

품질 Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection 공장

Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection

Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection Descripti on Yttrium Oxide (Y₂O₃) Spray Coating Powder is a high-performance ceramic material developed for protective coatings in advanced semiconductor fabrication equipment. Designed for plasma spray and thermal spray ...

조회를 요청하다

아래의 온라인 문의 연락 양식을 사용하시기 바랍니다. 질문이 있으시면 저희 팀이 가능한 한 빨리 연락합니다.

최대 5개의 파일을 업로드할 수 있고 각 파일 크기는 최대 10M입니다.