Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection
Product Details
| Material: | Yttrium Oxide (Y₂O₃) | Purity: | 99.9% |
|---|---|---|---|
| Particle Shape: | Spherical / Agglomerated | Chemical Stability: | Outstanding |
| Contamination Level: | Ultra-Low | Particle Size Range: | 10–65 μm |
| Highlight |
Yttria thermal spray powder,Y₂O₃ plasma etching protection,Rare earth oxide thermal coating |
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Product Description
Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection
Description
Yttrium Oxide (Y₂O₃) Spray Coating Powder is a high-performance ceramic material developed for protective coatings in advanced semiconductor fabrication equipment. Designed for plasma spray and thermal spray technologies, the material forms a dense yttria ceramic layer that protects equipment components operating under aggressive plasma processing environments.
In semiconductor manufacturing processes such as plasma etching, deposition, and cleaning, chamber components are continuously exposed to fluorine-based reactive gases and energetic ions. Y₂O₃ coatings provide superior chemical stability and plasma erosion resistance, effectively reducing contamination sources and ensuring stable process performance.
The material is engineered with controlled particle morphology and optimized size distribution to achieve high coating adhesion strength, uniform microstructure, and excellent coating durability.
Product Features
Outstanding Plasma Durability
Yttria coatings exhibit excellent resistance against fluorocarbon plasma corrosion, making them ideal for next-generation semiconductor nodes.
Reduced Particle Generation
The dense ceramic coating structure minimizes micro-flaking and particle shedding inside processing chambers.
Improved Process Stability
Stable surface chemistry helps maintain repeatable semiconductor process conditions and enhances manufacturing yield.
High Deposition Efficiency
Optimized powder morphology ensures excellent flowability and coating uniformity during plasma spraying.
Long Service Lifetime
Significantly extends maintenance intervals compared with conventional ceramic coatings.
Typical Applications
Semiconductor Equipment Protection
- Plasma Etching Systems
- CVD / PECVD
- ALD Systems
- Dry Cleaning Chambers
Coated Components
- Electrostatic Chucks (ESC)
- Chamber Liners
- Gas Distribution Plates
- Edge Rings and Shields
Particle Size Distribution
Manufacturing & Quality Control
Manufactured using advanced rare earth processing technologies:
- High-purity yttria synthesis
- Controlled spray-grade granulation
- Strict impurity monitoring
- Semiconductor material quality assurance
Product Highlights
Yttria (Y₂O₃) Thermal Spray Powder For Plasma Etching Chamber Protection Description Yttrium Oxide (Y₂O₃) Spray Coating Powder is a high-performance ceramic material developed for protective coatings in advanced semiconductor fabrication equipment. Designed for plasma spray and thermal spray ...
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Cerium Oxalate Powder Chemical Reagent Elements
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