Quality High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment factory
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Quality High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment factory
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High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment

Brand Name: LICHEN
Model Number: LC
Place of Origin: CHINA
Certification: ISO
Minimum Order Quantity: 20KGS
Price: Contact Sales Team for Quotation
Supply Ability: 3000MT/YEAR

Product Details


Chemical Formula: Y₂O₃ Purity: 99.99%
Morphology: Spherical / Agglomerated Melting Point: 2430°C
Particle Size: Customizable Impurity Control: Semiconductor Grade
Highlight

high-purity yttrium oxide semiconductor coating

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yttrium oxide thermal spray coating

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rare earth oxide plasma spray coating

Product Description


High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment

Description

High-purity yttrium oxide powder designed for plasma spray coating of semiconductor equipment. Excellent plasma corrosion resistance, low particle contamination, and extended chamber lifetime.

Product Features

Superior Plasma Corrosion Resistance

Yttrium oxide demonstrates outstanding resistance to fluorine and chlorine plasma environments commonly used in semiconductor etching and deposition processes.

Low Particle Contamination

Dense Y₂O₃ coatings significantly reduce particle shedding, helping maintain ultra-clean semiconductor production conditions and improving wafer yield.

Extended Equipment Lifetime

Protects chamber components from chemical erosion and plasma damage, lowering maintenance frequency and operational downtime.

Excellent Thermal Stability

High melting point and chemical inertness allow stable performance under extreme temperatures and high-energy plasma exposure.

Typical Applications

Semiconductor Process Equipment Protection

  • Plasma Etching Chambers
  • CVD / PECVD Systems
  • ALD Deposition Equipment
  • Plasma Cleaning Systems

Key Components

  • Electrostatic Chuck (ESC) coating
  • Focus Rings
  • Shower Heads
  • Chamber Liners
  • Edge Rings & Shields
  • Wafer Handling Components

 

Particle Size Distribution


High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment 0

Quality & Manufacturing

Produced under strict semiconductor material quality control:

  • High-purity rare earth refining process
  • Controlled particle morphology engineering
  • Advanced granulation technology
  • Multi-stage impurity monitoring

Competitive Advantages

  • Semiconductor-grade purity control
  • Stable global export supply
  • Custom spray coating optimization
  • Technical support for coating processes
  • Reliable batch-to-batch consistency

Product Highlights

High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment Description High-purity yttrium oxide powder designed for plasma spray coating of semiconductor equipment. Excellent plasma corrosion resistance, low particle contamination, and extended chamber ...

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