High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment
Product Details
| Chemical Formula: | Y₂O₃ | Purity: | 99.99% |
|---|---|---|---|
| Morphology: | Spherical / Agglomerated | Melting Point: | 2430°C |
| Particle Size: | Customizable | Impurity Control: | Semiconductor Grade |
| Highlight |
high-purity yttrium oxide semiconductor coating,yttrium oxide thermal spray coating,rare earth oxide plasma spray coating |
||
Product Description
High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment
Description
High-purity yttrium oxide powder designed for plasma spray coating of semiconductor equipment. Excellent plasma corrosion resistance, low particle contamination, and extended chamber lifetime.
Product Features
Superior Plasma Corrosion Resistance
Yttrium oxide demonstrates outstanding resistance to fluorine and chlorine plasma environments commonly used in semiconductor etching and deposition processes.
Low Particle Contamination
Dense Y₂O₃ coatings significantly reduce particle shedding, helping maintain ultra-clean semiconductor production conditions and improving wafer yield.
Extended Equipment Lifetime
Protects chamber components from chemical erosion and plasma damage, lowering maintenance frequency and operational downtime.
Excellent Thermal Stability
High melting point and chemical inertness allow stable performance under extreme temperatures and high-energy plasma exposure.
Typical Applications
Semiconductor Process Equipment Protection
- Plasma Etching Chambers
- CVD / PECVD Systems
- ALD Deposition Equipment
- Plasma Cleaning Systems
Key Components
- Electrostatic Chuck (ESC) coating
- Focus Rings
- Shower Heads
- Chamber Liners
- Edge Rings & Shields
- Wafer Handling Components
Particle Size Distribution

Quality & Manufacturing
Produced under strict semiconductor material quality control:
- High-purity rare earth refining process
- Controlled particle morphology engineering
- Advanced granulation technology
- Multi-stage impurity monitoring
Competitive Advantages
- Semiconductor-grade purity control
- Stable global export supply
- Custom spray coating optimization
- Technical support for coating processes
- Reliable batch-to-batch consistency
Product Highlights
High-Purity Yttrium Oxide (Y₂O₃) For Thermal & Plasma Spray Coating In Semiconductor Processing Equipment Description High-purity yttrium oxide powder designed for plasma spray coating of semiconductor equipment. Excellent plasma corrosion resistance, low particle contamination, and extended chamber ...
CMP-Grade Ceria Polishing Powder For AR Optics, Micro-Lens Arrays & Wearable Optical Sensors
CMP-Grade Ceria Polishing Powder For AR Optics, Micro-Lens Arrays & Wearable Optical Sensors Product Overview This CMP-grade ceria polishing powder is engineered for next-generation micro-optical components used in AR wearables, optical sensors, and miniaturized imaging systems. Featuring controlled reactivity and ultra-fine particle engineering, the product enables atomic-level surface finishing required for high-resolution optical performance and advanced photonics
Ultra-Fine Ceria Oxide Polishing Powder For Smart Wearable Cover Glass & Micro-Optics Finishing
Ultra-Fine Ceria Oxide Polishing Powder For Smart Wearable Cover Glass & Micro-Optics Finishing Product Overview Developed for high-volume wearable electronics production, this ultra-fine cerium oxide polishing powder enables superior finishing of smartwatch cover glass, AR headset lenses, camera windows, and micro-optical assemblies. The formulation balances chemical activity and mechanical abrasion to deliver mirror-grade surfaces while maintaining high throughput in
High Purity Cerium Oxide Polishing Powder For AR Waveguide Glass & Optical Lens Manufacturing
High Purity Cerium Oxide Polishing Powder For AR Waveguide Glass & Optical Lens Manufacturing Product Overview This high-purity ceria polishing powder is specially engineered for ultra-precision polishing of AR waveguide optics, smart glasses lenses, and advanced wearable optical modules. Designed for next-generation augmented reality manufacturing, the product delivers controlled chemical-mechanical polishing (CMP) performance, achieving exceptional surface flatness and
Cerium Oxalate Powder Chemical Reagent Elements
Cerium oxalate is an oxalate salt of trivalent cerium and an important rare earth compound, often existing in the form of hydrate. 1. Basic Information English Name: Cerium(III) oxalate, Cerous oxalate Chemical Formula: (usually hydrate, where x is mostly 9 or 10) Molecular Weight (Anhydrous): 544.29 : Anhydrous: 139-42-4 Hydrate: 15750-47-7 2. Physical and Chemical Properties Appearance: White or pale yellow crystalline powder, odorless and tasteless. Solubility: Practically
Please use our online inquiry contact form below if you have any questions, our team will get back to you as soon as possible.